The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Oct. 15, 2001
Youichiroh Ide, Fuji, JP;
Hironobu Shirataki, Fuji, JP;
Kei Tomeba, Fuji, JP;
Taro Suzuki, Fuji, JP;
Fuji Photo Film Co., Ltd., Minami-Ashigara, JP;
Abstract
A heat sensitive type plate material for forming lithography comprising a substrate ( ) and, formed thereon, a heat sensitive layer ( ), which in turn comprises a hydrophilic polymer ( ) having a Lewis base moiety, lipophilic part forming particles ( ) which form a lipophilic part on the surface of a plate through the change caused by heat, and polyvalent metal oxide particles ( ), the lipophilic part forming particles ( ) and the polyvalent metal oxide particles ( ) being dispersed homogeneously in the heat sensitive layer ( ). The plate material requires no developing process on forming a plate, and can form a lithography which has not only high mechanical strength, but also high printing durability, and further can be prepared with no significant increase of production cost.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile