Ibaraki, Japan

Kei Shibayama

This inventor holds 4 USPTO granted patents. Top assignee: Hitachi High-Tech Corporation. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kei Shibayama. Retrieved from https://idiyas.com/inventor/kei-shibayama-2rcepcxo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1


Location History:

  • Ibaraki, JP (2022 - 2024)
  • Tokyo, JP (2024)

Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

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Title: Innovator Spotlight: Kei Shibayama - Revolutionizing Charged Particle Beam Devices

Introduction: Kei Shibayama, a visionary inventor based in Ibaraki, Japan, has made a significant impact in the field of charged particle beam technology with his groundbreaking inventions.

Latest Patents: Kei Shibayama's latest patents include a Charged Particle Beam Device that addresses sample deformation on an electrostatic chuck mechanism. The innovative device enhances sample stability during exposure to charged particle beams, showcasing Shibayama's dedication to precision and efficiency.

Career Highlights: Shibayama is a key contributor at Hitachi High-Tech Corporation, where his creative solutions have propelled the company's advancements in semiconductor and nanotechnology industries. With a total of 2 patents to his name, Shibayama continues to drive innovation and excellence in his field.

Collaborations: Throughout his career, Kei Shibayama has collaborated closely with skilled professionals such as Akito Tanokuchi and Seiichiro Kanno, fostering a culture of teamwork and knowledge-sharing within Hitachi High-Tech Corporation.

Conclusion: In conclusion, Kei Shibayama stands as a pioneering inventor whose contributions have redefined the capabilities of charged particle beam devices. His dedication to enhancing sample stability and precision in technological applications continues to shape the industry, making him an invaluable asset to the field of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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