The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Oct. 07, 2019
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Yoshihiro Satou, Tokyo, JP;
Toshio Masuda, Tokyo, JP;
Hitoshi Matsuno, Tokyo, JP;
Kei Shibayama, Tokyo, JP;
Osamu Yoshimura, Ibaraki, JP;
Yuichirou Iijima, Tokyo, JP;
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/15 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/15 (2013.01); G01N 21/9501 (2013.01); G01N 2021/151 (2013.01);
Abstract
The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG.A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.