Kei Mihara

Title: Kei Mihara: Innovator in Pellicle Technology

Introduction

Kei Mihara is a notable inventor based in Azumino, Japan. He has made significant contributions to the field of pellicle technology, which is essential in the manufacturing of semiconductor devices. His innovative work has led to the development of a unique pellicle intermediary body that enhances the efficiency of the manufacturing process.

Latest Patents

Mihara holds a patent for a "Pellicle intermediary body, pellicle, method for manufacturing of pellicle intermediary body, and pellicle manufacturing method." This invention provides a pellicle intermediary body that consists of a silicon (Si) substrate, a silicon oxide film formed on the surface of the Si substrate, and a silicon layer on the silicon oxide film. The silicon layer features a low Crystal Originated Particle (COP) portion, which reduces the number of COPs as it approaches the surface of the silicon layer. This innovative design is crucial for improving the quality and reliability of semiconductor manufacturing.

Career Highlights

Kei Mihara is currently employed at Air Water Inc., where he continues to advance his research and development efforts in pellicle technology. His work has garnered attention in the industry, showcasing his expertise and commitment to innovation.

Collaborations

Mihara collaborates with esteemed colleagues, including Hidehiko Oku and Ichiro Hide. Their combined efforts contribute to the ongoing advancements in the field of semiconductor manufacturing.

Conclusion

Kei Mihara's contributions to pellicle technology exemplify the importance of innovation in the semiconductor industry. His patented inventions and collaborative efforts continue to shape the future of manufacturing processes.