Amagasaki, Japan

Kei Hayashida

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Plant Technologies, Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kei Hayashida. Retrieved from https://idiyas.com/inventor/kei-hayashida-2jj6k6v8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Kei Hayashida: Innovator in Filter Technology

Introduction

Kei Hayashida is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of filter technology, particularly through his innovative designs and patents. His work is recognized for its impact on various industrial applications.

Latest Patents

Hayashida holds a patent for a "Frame for immersion flat filter membrane elements." This invention showcases his expertise in developing efficient filtration systems that are essential in numerous industries.

Career Highlights

Kei Hayashida is currently employed at Hitachi Plant Technologies, Ltd. His role at the company allows him to leverage his skills in engineering and innovation to advance the field of filtration technology. His dedication to research and development has positioned him as a key player in his industry.

Collaborations

Hayashida has collaborated with talented coworkers, including Yasuyuki Okuno and Yusuke Okawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

In summary, Kei Hayashida is a distinguished inventor whose work in filter technology has made a significant impact. His contributions continue to influence the industry, and his collaborations with fellow innovators further enhance his achievements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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