This inventor holds 1 USPTO granted patent. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Kei Fujibayashi: Innovator in Dielectric Thin Film Technology
Introduction
Kei Fujibayashi is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of dielectric thin film technology. His innovative methods have paved the way for advancements in various applications.
Latest Patents
Fujibayashi holds a patent for a method of forming a dielectric thin film pattern. This method involves depositing a dielectric thin film on a substrate that has a resist pattern using a vapor deposition method. The materials used for the dielectric thin film include at least one of CeO₂, Sm₂O₃, Dy₂O₃, Y₂O₃, TiO₂, Al₂O₃, and MgO. The process concludes with the removal of the resist pattern, resulting in a patterned dielectric thin film. He has 1 patent to his name.
Career Highlights
Fujibayashi is associated with Murata Manufacturing Co., Ltd., a leading company in the electronics industry. His work has contributed to the development of advanced materials and technologies that are essential for modern electronic devices.
Collaborations
Some of his notable coworkers include Ryoichiro Takahashi and Tadayuki Okawa. Their collaborative efforts have further enhanced the research and development initiatives within their field.
Conclusion
Kei Fujibayashi is a prominent figure in the realm of dielectric thin film technology. His innovative methods and contributions continue to influence advancements in electronics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile