Hsinchu, Taiwan

Keh-Chyang Leou


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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2 patents (USPTO):Explore Patents

Title: Innovations in Plasma Technology by Keh-Chyang Leou

Introduction

Keh-Chyang Leou, an esteemed inventor based in Hsinchu, Taiwan, has made significant contributions to the field of plasma technology. With a notable portfolio comprising two patents, Leou's work focuses on enhancing the efficiency and control of plasma processes, which are crucial in various applications, including semiconductor manufacturing and materials processing.

Latest Patents

Leou's recent patents reflect his innovative approach to plasma fabrication. His invention, titled "Process for fabricating plasma with feedback control on plasma density - Inductively-coupled high density plasma producing apparatus and plasma," showcases a sophisticated system for controlling plasma density. The apparatus comprises several key components, including a shape-adjustable coil (antenna), a RF power generator, an impedance matching network, a plasma chamber, a gas supply system, and a vacuum system. This inventive design allows for refined control over the plasma density profile, leading to improved uniformity in plasma processes.

Career Highlights

Throughout his career, Keh-Chyang Leou has been affiliated with esteemed organizations such as the National Science Council. His experience in these institutions has undoubtedly fueled his innovative spirit and contributed to his advancements in plasma technology.

Collaborations

Leou has collaborated with notable professionals in his field, including Chuen-Horng Tsai and Cheng-Hung Chang. These partnerships have fostered a collaborative environment conducive to research and innovation, allowing for the exchange of ideas and technical expertise that enhance their collective work in plasma technologies.

Conclusion

Keh-Chyang Leou continues to be a pivotal figure in the realm of plasma innovation. His groundbreaking patents and collaborative efforts with fellow researchers underscore his commitment to advancing technology in this critical area. As industries increasingly pivot towards more efficient plasma applications, Leou's contributions will likely play a crucial role in shaping the future of plasma processing technologies.

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