Other

National Science Council

Keh-Chyang Leou

Chuen-Horng Tsai

Tsang-Lang Lin

Chai-Hao Chang

Chaung Lin

Yi-Mei Yang

Cheng-Hung Chang

I G Chen

Szu-Che Tsai

Process for fabricating plasma with feedback control on plasma density

This invention relates to an inductively-coupled high density plasma producing apparatus and a plasma processing equipment having the apparatus. The plasma processing equipment consists of a shape-adjustable coil (antenna), a RF power generator, an impedance matching network, a plasma chamber, a gas supply system, and a vacuum system. The gases for producing plasma are fed into the plasma chamber. The RF power is fed into the coil to produce plasma in the plasma chamber. This invention is characterized by the provision of a shape-adjustable coil, which is used to shape the RF power profile in the plasma chamber such that the plasma density profile (uniformity) can be controlled.

Inductively-coupled high density plasma producing apparatus and plasma

Growing community of inventors

Hsinchu, Taiwan

Keh-Chyang Leou