Nijmegen, Netherlands

Kees Van Hasselt

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kees Van Hasselt. Retrieved from https://idiyas.com/inventor/kees-van-hasselt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Kees Van Hasselt: Innovator in Photomask Technology

Introduction

Kees Van Hasselt is a notable inventor based in Nijmegen, Netherlands. He has made significant contributions to the field of photomask technology, particularly through his innovative patent. His work is recognized within the industry, and he is associated with a prominent company.

Latest Patents

Kees Van Hasselt holds a patent for a "Photomask provided with an ESD-precluding envelope." This invention addresses critical issues related to electrostatic discharge (ESD) in photomask applications, enhancing the reliability and performance of photomasks used in semiconductor manufacturing. He has 1 patent to his name, showcasing his expertise in this specialized area.

Career Highlights

Kees is currently employed at U.S. Philips Corporation, a leading technology company known for its innovations in electronics and healthcare. His role at Philips allows him to work on cutting-edge technologies and contribute to advancements in the industry. His career reflects a commitment to innovation and excellence.

Collaborations

Kees has collaborated with various professionals in his field, including his coworker Jan W Gemmink. These collaborations have fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Kees Van Hasselt is a distinguished inventor whose work in photomask technology has made a significant impact. His patent and contributions to U.S. Philips Corporation highlight his dedication to innovation in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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