Kuala Lumpur, Malaysia

Kee Cheong Fam


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kee Cheong Fam: Innovator in Pressure Sensor Technology

Introduction

Kee Cheong Fam is a notable inventor based in Kuala Lumpur, Malaysia. He has made significant contributions to the field of sensor technology, particularly with his innovative designs that enhance the functionality and reliability of pressure sensors. His work is recognized for its practical applications in various industries.

Latest Patents

Kee Cheong Fam holds a patent for a pressure sensor device with a gel retainer. This device features a gel retainer that is mounted or formed on a substrate. The gel retainer contains a cavity where a pressure sensing die is mounted. This die is electrically connected to one or more other package elements. A pressure-sensitive gel material is dispensed into the cavity to cover the active region of the pressure sensing die. Additionally, a mold compound is applied on the upper surface of the substrate outside of the gel retainer. This innovative design improves the performance and durability of pressure sensors.

Career Highlights

Kee Cheong Fam is currently employed at Freescale Semiconductor, Inc., where he continues to develop cutting-edge technologies in the field of sensors. His work at Freescale has allowed him to collaborate with other talented professionals in the industry, further enhancing his expertise and contributions.

Collaborations

Kee Cheong Fam has worked alongside notable colleagues such as Mohd Rusli Ibrahim and Lan Chu Tan. Their collaborative efforts have led to advancements in sensor technology and have contributed to the success of their projects.

Conclusion

Kee Cheong Fam is a distinguished inventor whose work in pressure sensor technology has made a significant impact. His innovative designs and collaborations continue to push the boundaries of what is possible in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…