Hangzhou, China

Ke Ma

This inventor holds 1 USPTO granted patent. Top assignee: Hangzhou Qunhe Information Technology Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ke Ma. Retrieved from https://idiyas.com/inventor/ke-ma-x1pwlnub

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ke Ma - Innovator in Three-Dimensional Rendering Technology

Introduction

Ke Ma is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of graphic rendering, particularly through his innovative patent that enhances the efficiency of three-dimensional model and material merging.

Latest Patents

Ke Ma holds a patent for a "Three-dimensional model and material merging method, device, terminal, storage medium and rendering method." This invention discloses a comprehensive approach to merging three-dimensional models and materials, which includes obtaining model files, material files, and texture maps. The method optimizes the storage size of three-dimensional models and texture map puzzles, thereby improving rendering efficiency and reducing data loading on the CPU.

Career Highlights

Ke Ma is associated with Hangzhou Qunhe Information Technology Co., Ltd., where he applies his expertise in graphic rendering technology. His work focuses on enhancing the speed and efficiency of rendering processes, which is crucial in various applications, including gaming and virtual reality.

Collaborations

Ke Ma collaborates with talented individuals such as Rui Tang and Hailin Zhang, contributing to advancements in their shared field of expertise.

Conclusion

Ke Ma's innovative work in three-dimensional rendering technology exemplifies the impact of inventions on improving efficiency in graphic applications. His contributions continue to shape the future of rendering technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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