Company Filing History:
Years Active: 2023
Title: Ke-Ke Ren: Innovator in Disparity Map Technology
Introduction
Ke-Ke Ren is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of image processing and disparity map technology. With a total of 2 patents, Ren's work focuses on enhancing the accuracy and efficiency of image analysis.
Latest Patents
Ke-Ke Ren's latest patents include innovative technologies that improve disparity map building. The first patent, titled "Disparity map building using guide node," describes an apparatus that utilizes an interface and a processor. This apparatus is designed to receive pixel data and generate reference and target images. The processor performs disparity operations to build a disparity map based on the pixel data. The operations involve selecting a guide node, determining peak locations, and generating values in the disparity map.
The second patent, "Mounting calibration of structured light projector in mono camera stereo system," also features an interface and a processor. This invention focuses on generating reference and target images from pixel data, performing disparity operations, and building a disparity angle map. The process includes selecting grid pixels, measuring disparity angles, and generating values in the disparity angle map using calculated coefficients.
Career Highlights
Ke-Ke Ren is currently employed at Ambarella International LP, where he continues to develop cutting-edge technologies in image processing. His work has garnered attention for its potential applications in various industries, including robotics and computer vision.
Collaborations
Ren collaborates with fellow inventor Zhi He, contributing to advancements in their shared field of expertise.
Conclusion
Ke-Ke Ren's innovative patents and contributions to disparity map technology highlight his role as a leading inventor in the field. His work at Ambarella International LP continues to push the boundaries of image processing technology.