Kazyuki Hayashi

Title: Kazyuki Hayashi: Innovator in EUV Lithography

Introduction

Kazyuki Hayashi is a prominent inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of lithography, particularly in the development of reflective mask blanks for extreme ultraviolet (EUV) lithography. His innovative work has garnered attention in the industry, showcasing his expertise and dedication to advancing technology.

Latest Patents

Kazyuki Hayashi holds a patent for a reflective mask blank for EUV lithography. This invention provides a reflective mask blank that features an absorber layer with low reflectance in the wavelength regions of EUV light and pattern inspection light. The film composition and thickness of the absorber layer are easily controllable to desired specifications. The reflective mask blank comprises a substrate, a reflective layer to reflect EUV light, and an absorber layer to absorb EUV light, formed in that order on the substrate. The absorber layer contains tantalum (Ta), boron (B), and silicon (Si), with specific content requirements for B and Si, while ensuring minimal nitrogen (N) content.

Career Highlights

Kazyuki Hayashi is associated with Asahi Glass Company, Limited, where he has been instrumental in research and development efforts. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the advancement of EUV lithography technology.

Collaborations

Throughout his career, Kazyuki has collaborated with notable colleagues, including Kazuo Kadowaki and Masaki Mikami. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Kazyuki Hayashi's contributions to EUV lithography through his innovative patent demonstrate his expertise and commitment to technological advancement. His work continues to influence the industry and pave the way for future innovations.