Fukui, Japan

Kazuyuki Murase

This inventor holds 1 USPTO granted patent. Top assignee: Seiren Company, Ltd. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuyuki Murase. Retrieved from https://idiyas.com/inventor/kazuyuki-murase-p8o7qc58

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Kazuyuki Murase: Innovator in Complex Materials

Introduction

Kazuyuki Murase is a notable inventor based in Fukui, Japan. He has made significant contributions to the field of complex materials, particularly in the development of innovative ion conduction films. His work emphasizes efficiency and practicality, making strides in the realm of material science.

Latest Patents

Murase holds a patent for a complex material that features an ion conduction film capable of curving and deforming when a potential difference is applied. This invention operates at low electric power while exhibiting a large deformation amount and quick response performance. The material also offers a high degree of freedom in shape and is easy to control during deformation. Additionally, it possesses the necessary strength and durability for practical applications, all while being economically viable.

Career Highlights

Kazuyuki Murase is associated with Seiren Company, Ltd., where he continues to innovate and develop new materials. His work has garnered attention for its potential applications in various industries, showcasing his expertise in material science.

Collaborations

Murase has collaborated with notable colleagues, including Susumu Takagi and Masakazu Nomura. Their combined efforts contribute to advancements in the field of complex materials.

Conclusion

Kazuyuki Murase's contributions to the development of complex materials highlight his innovative spirit and dedication to practical solutions in material science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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