Location History:
- Osaka, JP (2010)
- Ibaraki, JP (2018)
Company Filing History:
Years Active: 2010-2018
Title: Kazuyoshi Shiomi: Innovator in Multilayer Substrate Technology
Introduction
Kazuyoshi Shiomi is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of multilayer substrate technology, holding a total of 2 patents. His work focuses on enhancing the manufacturing processes and materials used in electronic components.
Latest Patents
Kazuyoshi Shiomi's latest patents include a method for manufacturing multilayer substrates and a thermosetting resin composition. The first patent describes a manufacturing method that utilizes a multilayer insulation film. This film consists of a first insulation layer and a second insulation layer laminated on one surface of the first layer. The method allows for the selective removal of the second insulation layer to create a groove, facilitating the formation of metal wiring within the insulation layer. The second patent presents a thermosetting resin composition that excels in dielectric characteristics and dimensional stability at high temperatures. This composition is designed to produce resin sheets that maintain their integrity even after exposure to thermal history.
Career Highlights
Kazuyoshi Shiomi is currently employed at Sekisui Chemical Co., Ltd., where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology behind multilayer substrates, which are crucial for modern electronic devices.
Collaborations
Kazuyoshi has collaborated with notable colleagues such as Kazutaka Shirahase and Tatsushi Hayashi. Their combined expertise has contributed to the development of advanced materials and manufacturing techniques.
Conclusion
Kazuyoshi Shiomi's contributions to multilayer substrate technology and thermosetting resin compositions highlight his role as a leading inventor in the field. His innovative approaches continue to influence the electronics industry, paving the way for future advancements.