Isesaki, Japan

Kazuya Kashimata

This inventor holds 6 USPTO granted patents. Top assignees: Koike Sanso Kogyo Co., Ltd., Voike Sanso Kogyo Co., Ltd.. Active years: 2012-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuya Kashimata. Retrieved from https://idiyas.com/inventor/kazuya-kashimata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 6

Forward Citations = 107(Granted Patents)


Company Filing History:


Years Active: 2012-2014

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6 patents (USPTO):Explore Patents

Title: Innovator Kazuya Kashimata: Pioneering Plasma Torch Technology

Kazuya Kashimata, an accomplished inventor located in Isezaki, Japan, has made significant contributions to the field of plasma technology. With a total of six patents to his name, he has consistently pushed the boundaries of innovation in this specialized area.

Latest Patents

Among his most notable patents are those for the outer nozzle for plasma torches and an electrode for plasma torches. These innovations have the potential to improve efficiency and effectiveness in various industrial applications, highlighting Kashimata's expertise in advancing plasma technology.

Career Highlights

Throughout his career, Kazuya Kashimata has worked for leading companies within the industry, including Koike Sanso Kogyo Co., Ltd. and Voike Sanso Kogyo Co., Ltd. At these firms, he has been instrumental in developing advanced technologies that have been adopted worldwide.

Collaborations

Kashimata has collaborated with talented coworkers such as Akira Furujo and Masatoshi Motoyama. These partnerships have fostered an environment of creativity and innovation, allowing him to bring new ideas to life.

Conclusion

Kazuya Kashimata's relentless pursuit of innovation in plasma technology has solidified his reputation as a notable inventor. As he continues to develop groundbreaking solutions, his impact on the industry will undoubtedly be felt for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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