Location History:
- Osaka, JP (1992 - 1994)
- Ibaraki, JP (1994)
Company Filing History:
Years Active: 1992-1994
Title: Kazuto Fukuma: Innovator in Semiconductor Technology
Introduction
Kazuto Fukuma is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative work focuses on enhancing the performance and reliability of semiconductor materials.
Latest Patents
Fukuma's latest patents include a groundbreaking development in boron phosphorus silicate glass composite layers on semiconductor wafers. This invention describes a novel two-step process for forming a composite BPSG insulating and planarizing layer. The process ensures the absence of discernible voids and provides a surface resistant to boron loss during subsequent etching steps. The first step involves a CVD deposition using gaseous sources of phosphorus and boron dopants along with tetraethylorthosilicate (TEOS) as the silicon source. The second step employs a plasma-assisted CVD deposition to create a non-hygroscopic BPSG cap layer.
Another notable patent by Fukuma is a two-step process for forming a void-free silicon oxide layer over stepped surfaces of semiconductor wafers. This method inhibits void formation by utilizing a gaseous mixture comprising a source of oxygen, including ozone, and tetraethylorthosilicate as the silicon source. The process is carefully controlled by maintaining specific pressure conditions in the CVD chamber during both deposition steps.
Career Highlights
Kazuto Fukuma is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has significantly advanced the understanding and application of materials in semiconductor manufacturing.
Collaborations
Fukuma has collaborated with notable colleagues, including Peter W. Lee and David N. Wang. Their combined expertise has contributed to the successful development of innovative semiconductor technologies.
Conclusion
Kazuto Fukuma's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.