Tokyo, Japan

Kazusato Hara

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Gas Chemical, Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazusato Hara. Retrieved from https://idiyas.com/inventor/kazusato-hara-g80le6e4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 14.0

ph-index = 1

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kazusato Hara: Pioneer in Semiconductor Cleaning Solutions

Introduction: Kazusato Hara, an innovative inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. His work focuses on developing specialized cleaning solutions essential for maintaining the integrity and performance of semiconductor devices. With a unique patent to his name, Hara exemplifies the spirit of innovation in the high-tech industry.

Latest Patents: Hara holds a notable patent for a cleaning liquid specifically designed for producing semiconductor devices. This cleaning liquid consists of several key components: a fluorine-containing compound, a water-soluble or water-miscible organic solvent, and an inorganic acid and/or organic acid. Additionally, the formulation may include either a quaternary ammonium salt or specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt. The patent also describes a production process that involves forming a resist pattern on a substrate covered with either an insulating film or a metallic electroconductive layer. Through a sequence of dry etching, ashing treatment with oxygen plasma, and the innovative cleaning treatment using the developed liquid, the deposit polymer formed during dry etching can be effectively removed without damaging the metallic or insulating films.

Career Highlights: Kazusato Hara has dedicated his professional career to advancing semiconductor manufacturing technology. He works at Mitsubishi Gas Chemical, Inc., where he collaborates with his team to innovate and enhance production processes. Hara's research and development focus on improving cleaning methodologies has positioned him as a key contributor within the company.

Collaborations: Throughout his career, Hara has teamed up with several accomplished colleagues, including Yoshimi Torii and Shunji Sasabe. Their combined expertise in semiconductor technology has fostered a dynamic and productive work environment at Mitsubishi Gas Chemical, Inc., enabling the creation of cutting-edge solutions aimed at improving the efficiency and reliability of semiconductor devices.

Conclusion: Kazusato Hara represents the forefront of innovation in the semiconductor industry. His patent for a specialized cleaning liquid reflects his commitment to excellence and sustainability in technology. With invaluable support from his colleagues and the resources available at Mitsubishi Gas Chemical, Inc., Hara continues to contribute to advancements that will shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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