Narashino, Japan

Kazuo Tsueda

This inventor holds 1 USPTO granted patent. Top assignee: Shinto Paint Co., Ltd.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuo Tsueda. Retrieved from https://idiyas.com/inventor/kazuo-tsueda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Kazuo Tsueda: Innovator in Substrate Manufacturing

Introduction

Kazuo Tsueda is a notable inventor based in Narashino, Japan. He has made significant contributions to the field of substrate manufacturing, particularly through his innovative methods that enhance the functionality of transparent substrates.

Latest Patents

Kazuo Tsueda holds a patent for a "Method for manufacturing a substrate having window-shaped coating films." This method involves creating a substrate with electrically conductive circuits on its surface, along with window-shaped coating films and a frame-shaped functional coating film in areas not occupied by the window-shaped films. This innovative approach improves the efficiency and effectiveness of substrate applications.

Career Highlights

Tsueda is associated with Shinto Paint Co., Ltd., where he has been instrumental in developing advanced manufacturing techniques. His work has contributed to the company's reputation for innovation in the paint and coating industry.

Collaborations

Throughout his career, Tsueda has collaborated with talented individuals such as Susumu Miyazaki and Tsuyoshi Nakano. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Kazuo Tsueda's contributions to substrate manufacturing exemplify the spirit of innovation. His patented methods and collaborations highlight the importance of teamwork in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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