Yokkaichi, Japan

Kazuo Tawarayama


Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2017-2018

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovator Kazuo Tawarayama: Pioneering Patents in Pattern Shape Adjustment

Introduction: Kazuo Tawarayama, a distinguished inventor based in Yokkaichi, Japan, has made significant contributions to the field of optical engineering with a focus on pattern shape adjustment. His innovative ideas have resulted in two notable patents that enhance manufacturing processes in the semiconductor industry.

Latest Patents: Tawarayama's recent patents include a "Pattern Shape Adjustment Method" and "Pattern Shape Adjustment System," alongside an "Exposure Apparatus" and "Recording Medium." The pattern shape adjustment method fundamentally involves acquiring a correspondence relation between the first shape feature amount of a pattern formed on a substrate and the first laser bandwidth of the exposure light used. By measuring the shape feature amount of a second pattern, Tawarayama calculates the laser bandwidth required for a third on-substrate pattern. This method ensures precision in laser exposure, vital for high-quality semiconductor manufacturing.

Additionally, the exposure apparatus incorporates an innovative mask alignment mark on a photomask. This mark employs a series of patterns arranged at specific pitches, optimizing the accuracy of latent image formation during the exposure process. Both patents showcase Tawarayama's commitment to refining technology for advanced device manufacturing.

Career Highlights: Kazuo Tawarayama has established a solid reputation for his expertise in optical systems while working with Toshiba Memory Corporation. His contributions to the company underscore his vital role in advancing their technological capabilities, particularly in the semiconductor sector.

Collaborations: Throughout his career, Tawarayama has collaborated with notable colleagues, including Nobuhiro Komine and Kazuya Fukuhara. Their collective efforts have led to breakthroughs in optical technologies, enhancing the efficiency and effectiveness of patterning processes in device fabrication.

Conclusion: Kazuo Tawarayama's innovative patents and collaborative endeavors profoundly impact the field of optical engineering. His work continues to be a driving force in the advancement of semiconductor technology, contributing to more precise and efficient manufacturing methods. As technologies evolve, Tawarayama remains at the forefront, exemplifying the spirit of innovation that defines successful inventors in today's dynamic landscape.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…