Company Filing History:
Years Active: 1992-1993
Title: Kazuo Takemura: Innovator in Silicon Dioxide Film Technology
Introduction
Kazuo Takemura is a notable inventor based in Takarazuka, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon dioxide films. With a total of 3 patents to his name, Takemura's work has advanced the capabilities of electronic devices.
Latest Patents
One of Takemura's latest patents is a method for manufacturing layer-built material with a silicon dioxide film. This innovative method involves contacting a substrate with a processing solution containing silicofluoric acid solution supersaturated with silicon dioxide. The process ensures the formation of a silicon dioxide film on the substrate, incorporating organic colorants without defects such as air bubbles or undecomposed raw materials. Another significant patent is for a thin film capacitor that boasts high performance characteristics, including high frequency capabilities, heat resistance, and dielectric strength. This capacitor is designed to meet the demands for high integration and miniaturization of electronic devices.
Career Highlights
Kazuo Takemura is currently associated with Nippon Sheet Glass Company, Limited, where he continues to innovate in the field of materials science. His work has been instrumental in enhancing the performance of electronic components through advanced manufacturing techniques.
Collaborations
Throughout his career, Takemura has collaborated with esteemed colleagues such as Hideo Kawahara and Juichi Ino. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Kazuo Takemura's contributions to the field of silicon dioxide film technology have positioned him as a key figure in materials science. His innovative patents reflect a commitment to advancing electronic device performance and functionality.