The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1992
Filed:
Mar. 29, 1990
Applicant:
Inventors:
Kazuo Takemura, Takarazuka, JP;
Juichi Ino, Nishinomiya, JP;
Hideo Kawahara, Mino, JP;
Masaki Kitaoka, Nishinomiya, JP;
Assignee:
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4274301 ; 8495 ; 4274432 ; 428412 ; 428409 ; 428428 ; 359884 ; 359350 ; 359885 ;
Abstract
A method for forming a silicon dioxide film according to the present invention comprises steps of: (i) contacting a substrate with processing solution containing silicofluoric acid solution supersaturated with silicon dioxide, and (ii) forming the silicon dioxide film on the substrate; wherein organic colorant(s) is/are introduced into the silicon dioxide film by adding organic colorant(s) to the processing solution. According to the present invention, a silicon dioxide film containing organic colorant without defect such as air bubbles, or undecomposed raw material.