Ome, Japan

Kazuo Suda

This inventor holds 1 USPTO granted patent. Top assignee: Taiyo Ink Manufacturing Co., Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuo Suda. Retrieved from https://idiyas.com/inventor/kazuo-suda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kazuo Suda: Innovator in Photocurable Thermosetting Resins

Introduction

Kazuo Suda is a notable inventor based in Ome, Japan. He has made significant contributions to the field of photocurable thermosetting resins. His innovative work has led to the development of a unique resin composition that is both environmentally friendly and efficient.

Latest Patents

Kazuo Suda holds a patent for a photocurable thermosetting resin composition that is developable with an aqueous alkali solution. This composition includes a photosensitive prepolymer, a diglycidyl ether type epoxy compound, a photopolymerization initiator, and a diluent. The specific ratios of these components are crucial for achieving the desired properties of the resin.

Career Highlights

Suda is associated with Taiyo Ink Manufacturing Co., Ltd., where he has been instrumental in advancing resin technology. His work has not only contributed to the company's portfolio but has also set new standards in the industry.

Collaborations

Throughout his career, Kazuo Suda has collaborated with esteemed colleagues such as Shigeru Komori and Masao Arima. These partnerships have fostered innovation and have led to the successful development of new materials.

Conclusion

Kazuo Suda's contributions to photocurable thermosetting resins exemplify the impact of innovative thinking in material science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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