Location History:
- Misato, JP (2009)
- Fukuyama, JP (2012 - 2016)
Company Filing History:
Years Active: 2009-2016
Title: Kazunori Ishikawa: Innovator in Polyamide and Epoxy Resin Technologies
Introduction
Kazunori Ishikawa is a prominent inventor based in Fukuyama, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyamide and epoxy resin compositions. With a total of 3 patents to his name, Ishikawa's work has advanced the capabilities of resin materials in various applications.
Latest Patents
Ishikawa's latest patents include innovative formulations that enhance the properties of polyamide resins. One notable patent describes a phenolic hydroxyl group-containing aromatic polyamide resin, which boasts a low ionic impurity content and improved adhesive properties. This resin composition allows for excellent flexibility, electrical properties, and flame retardancy in cured epoxy resin applications. Another patent focuses on a rubber-modified polyamide resin that combines a phenolic hydroxy group-containing segment with a butadiene (co)polymer segment. This invention results in a resin composition that excels in flexibility, heat resistance, and electrical properties, particularly under high temperature and humidity conditions.
Career Highlights
Kazunori Ishikawa is associated with Nippon Kayaku Kabushiki Kaisha, a company known for its innovative chemical products. His work at this organization has allowed him to explore and develop advanced materials that meet the demands of modern technology.
Collaborations
Ishikawa has collaborated with notable colleagues such as Makoto Uchida and Yasumasa Akatsuka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.
Conclusion
Kazunori Ishikawa's contributions to polyamide and epoxy resin technologies highlight his role as a key innovator in the industry. His patents reflect a commitment to enhancing material properties, which can lead to significant advancements in various applications.