Tachikawa, Japan

Kazunori Hasimoto

This inventor holds 3 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunori Hasimoto. Retrieved from https://idiyas.com/inventor/kazunori-hasimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.3

ph-index = 3

Forward Citations = 53(Granted Patents)


Company Filing History:


Years Active: 1994

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3 patents (USPTO):Explore Patents

Title: Kazunori Hasimoto: Innovator in Electron Beam Lithography

Introduction

Kazunori Hasimoto is a prominent inventor based in Tachikawa, Japan. He has made significant contributions to the field of electron beam lithography, a critical technology in the manufacturing of semiconductors. With a total of 3 patents to his name, Hasimoto continues to push the boundaries of innovation in his field.

Latest Patents

One of Hasimoto's latest patents is a processing machine for electron beam lithography systems. This invention aims to enhance the precision and efficiency of lithography processes, which are essential for producing high-performance electronic components. His work in this area reflects his commitment to advancing technology in semiconductor manufacturing.

Career Highlights

Kazunori Hasimoto is currently employed at Hitachi, Ltd., a leading company in technology and electronics. His role at Hitachi allows him to collaborate with other talented engineers and researchers, furthering the development of innovative solutions in the industry.

Collaborations

Hasimoto has worked alongside notable colleagues such as Takashi Yamamoto and Tomoyuki Miyata. Their combined expertise contributes to the success of their projects and the advancement of technology at Hitachi.

Conclusion

Kazunori Hasimoto is a key figure in the field of electron beam lithography, with a focus on developing advanced processing machines. His contributions and collaborations continue to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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