Odawara, Japan

Kazumi Ogashiwa

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazumi Ogashiwa. Retrieved from https://idiyas.com/inventor/kazumi-ogashiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Kazumi Ogashiwa: Innovator in Production Planning Systems

Introduction

Kazumi Ogashiwa is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of production planning systems, showcasing his expertise and innovative thinking.

Latest Patents

Kazumi Ogashiwa holds a patent for a production planning system. This invention relates to a system that assesses whether production can be executed based on requests from the sales side, demand forecasts, and specific production request numbers. The system accepts various inputs, including production request number information, parts list information, and inventory schedules. It calculates the necessary material amounts and generates production plans, ensuring that any production infeasible numbers are addressed appropriately.

Career Highlights

Kazumi Ogashiwa is associated with Hitachi, Ltd., a leading company in technology and innovation. His work has contributed to advancements in production efficiency and planning methodologies.

Collaborations

Kazumi has collaborated with notable coworkers, including Hidenori Ueno and Hiromitsu Asano, who have also contributed to the field of production planning and technology.

Conclusion

Kazumi Ogashiwa's innovative work in production planning systems exemplifies the impact of thoughtful engineering and design in enhancing manufacturing processes. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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