Kinokawa, Japan

Kazuma Ueki

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kazuma Ueki: Innovator in Sheet Processing Technology

Introduction

Kazuma Ueki is a notable inventor based in Kinokawa, Japan. He has made significant contributions to the field of sheet processing technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of material sheet processing.

Latest Patents

Kazuma Ueki holds a patent for a "Sheet Processing System." This system conveys a material sheet in a first direction and calculates the inclination angle of the first registration mark of the material sheet with respect to that direction. It includes cutting blades designed to cut the material sheet into smaller pieces and a cutting direction adjustment mechanism that aligns the cutting direction with the inclination angle. The system also conveys the sheet pieces in a second direction and features a guide member that extends in that direction to assist in guiding the cutting end of the sheet piece. Additionally, it has a processing place position identification section that identifies the position of the processing place based on the inclination angle, along with processing mechanisms that perform operations on the identified processing place.

Career Highlights

Kazuma Ueki is currently employed at Duplo Seiko Corporation, where he continues to innovate and develop new technologies in sheet processing. His work has been instrumental in advancing the capabilities of the company in this specialized field.

Collaborations

Kazuma collaborates with Akihiko Toki, a fellow innovator, to further enhance their projects and share insights in their respective areas of expertise.

Conclusion

Kazuma Ueki's contributions to sheet processing technology exemplify the spirit of innovation. His patent and ongoing work at Duplo Seiko Corporation highlight his commitment to advancing this field.

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