Nagano, Japan

Kazuma Fujihashi

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuma Fujihashi. Retrieved from https://idiyas.com/inventor/kazuma-fujihashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kazuma Fujihashi: Innovator in Liquid Ejecting Technology

Introduction

Kazuma Fujihashi is a notable inventor based in Nagano, Japan. He is recognized for his contributions to the field of liquid ejecting technology. His innovative work has led to the development of a unique liquid ejecting apparatus that enhances printing capabilities.

Latest Patents

Fujihashi holds a patent for a liquid ejecting apparatus. This apparatus features a digital signal output circuit and a liquid accommodating container. The design includes a print head with a supply port, a nozzle plate, and a substrate with multiple sides. The integrated circuit within the apparatus is designed to output an abnormality detection signal, ensuring efficient operation.

Career Highlights

Kazuma Fujihashi is currently employed at Seiko Epson Corporation, a leading company in printing technology. His work at Epson has allowed him to focus on advancing liquid ejecting systems, contributing to the company's reputation for innovation in the printing industry.

Collaborations

Fujihashi collaborates with Yasuhiko Kosugi, another talented individual in the field. Their partnership has fostered advancements in liquid ejecting technology, further enhancing the capabilities of their inventions.

Conclusion

Kazuma Fujihashi's contributions to liquid ejecting technology exemplify his innovative spirit and dedication to advancing printing solutions. His work continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…