Tokyo, Japan

Kazuki Uehara

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Eneos Corporation, Preferred Networks, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuki Uehara. Retrieved from https://idiyas.com/inventor/kazuki-uehara-ot43ce25

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 15.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kazuki Uehara: Innovator in Control Systems

Introduction

Kazuki Uehara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of control systems, particularly through his innovative patent that enhances operational efficiency in various plants.

Latest Patents

Uehara holds a patent for a control system, control method, and control program designed to determine operation data by repeatedly calculating control target data. This system includes at least one processor and memory, enabling it to determine operation data by calculating predicted values of control targets based on actual observation data from the plant. His patent is a testament to his expertise in developing advanced control technologies.

Career Highlights

Throughout his career, Kazuki Uehara has worked with notable companies such as Eneos Corporation and Preferred Networks, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of control systems.

Collaborations

Uehara has collaborated with talented individuals, including Taichiro Hirai and Kosei Kanuma. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Kazuki Uehara's work in control systems exemplifies the impact of innovative thinking in technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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