Kazuhisa Usuami

Title: Kazuhisa Usuami: Innovator in Semiconductor Cleaning Solutions

Introduction

Kazuhisa Usuami is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of semiconductor technology. His innovative work has led to the development of a specialized cleaning liquid that enhances the production process of semiconductor devices.

Latest Patents

Kazuhisa Usuami holds 1 patent for a cleaning liquid designed specifically for semiconductor devices. This cleaning liquid comprises a fluorine-containing compound, a water-soluble or water-miscible organic solvent, and an inorganic acid and/or organic acid. Additionally, it may include a quaternary ammonium salt or a specific organic carboxylic acid ammonium salt. The patent outlines a process for producing semiconductor devices that includes forming a resist pattern on a substrate, dry etching to create via holes or electric wiring, and using oxygen plasma for ashing treatment. The cleaning liquid effectively removes deposit polymers formed during dry etching without damaging the metallic or insulating films.

Career Highlights

Kazuhisa Usuami is associated with Mitsubishi Gas Chemical, Inc., where he has made significant strides in semiconductor cleaning technologies. His work has been instrumental in improving the efficiency and effectiveness of semiconductor device production.

Collaborations

Kazuhisa has collaborated with notable colleagues, including Yoshimi Torii and Shunji Sasabe. Their combined expertise has contributed to advancements in the semiconductor industry.

Conclusion

Kazuhisa Usuami's innovative contributions to semiconductor cleaning solutions highlight his role as a key inventor in this field. His patented cleaning liquid represents a significant advancement in semiconductor manufacturing processes.