Tokyo, Japan

Kazuhisa Osaka

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi-Kokusai Electric Inc., Techno Quartz Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhisa Osaka. Retrieved from https://idiyas.com/inventor/kazuhisa-osaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kazuhisa Osaka: Innovator in Pattern Wafer Technology

Introduction

Kazuhisa Osaka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly with his innovative work on pattern wafers. His expertise and creativity have led to the development of a patent that showcases his skills as an inventor.

Latest Patents

Kazuhisa Osaka holds a patent for a pattern wafer. This invention reflects his dedication to advancing technology and improving manufacturing processes in the semiconductor industry. The patent demonstrates his ability to create solutions that address complex challenges in the field.

Career Highlights

Throughout his career, Kazuhisa Osaka has worked with prominent companies such as Hitachi Kokusai Electric Inc. and Techno Quartz Inc. His experience in these organizations has allowed him to hone his skills and contribute to various projects that have had a lasting impact on the industry.

Collaborations

Kazuhisa has collaborated with talented individuals, including Hiromi Okada and Masayuki Yamada. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Kazuhisa Osaka is a distinguished inventor whose work in pattern wafer technology has made a significant impact in the field. His contributions, along with his collaborations, continue to inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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