This inventor holds 4 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1991-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kudamatsu, JP (1996)
- Yokohama, JP (1991 - 1998)
Company Filing History:
Years Active: 1991-1998
Title: Kazuhiro Ohara: Innovator in Plasma Processing Technology
Introduction
Kazuhiro Ohara is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of plasma processing, holding a total of 4 patents. His work focuses on improving methods and apparatuses for plasma processing, which are essential in semiconductor manufacturing.
Latest Patents
Ohara's latest patents include a plasma processing method and apparatus that utilizes plasma produced by a specialized chamber. This apparatus features a stage for placing substrates, an exhaust port, and a gas introduction nozzle. It also includes a cavity resonator that maintains a vacuum within the chamber while allowing microwaves to be introduced. The design aims to enhance the intensity of the electromagnetic field, thereby producing plasma for effective substrate processing.
Another notable patent involves a method and apparatus for removing foreign particles in a vacuum or dry atmosphere. This innovation separates foreign particles from substrates by applying both a separating force and a vibrating force. By adjusting the frequency of vibration to match the resonant frequency of the particles and substrate, the method effectively reduces foreign particle contamination, promoting higher yields in semiconductor and TFT manufacturing.
Career Highlights
Kazuhiro Ohara is currently employed at Hitachi, Ltd., where he continues to develop innovative technologies in plasma processing. His expertise has positioned him as a key figure in advancing semiconductor manufacturing techniques.
Collaborations
Ohara has collaborated with notable colleagues, including Toru Otsubo and Ichirou Sasaki. Their combined efforts have contributed to the development of cutting-edge technologies in the field.
Conclusion
Kazuhiro Ohara's contributions to plasma processing technology have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile