This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Kazuhiro Nakajima: Innovator in Plasma Treatment Technology
Introduction
Kazuhiro Nakajima is a notable inventor recognized for his contributions to plasma treatment technology. He is based in Ome, Japan, and has made significant advancements in the field of material treatment using plasma.
Latest Patents
Kazuhiro Nakajima holds a patent for an "Apparatus for treating material by using plasma." This innovative sputter etching apparatus includes a vacuum chamber equipped with a gas supply system and an evacuator. It features a sputter etching electrode where a substrate is placed, along with a plasma generator that produces plasma through microwave energy. The design incorporates a voltage applying stud to facilitate ion impact on the substrate, enhancing the treatment process. Additionally, the apparatus can include a magnetic field generating assembly to optimize plasma behavior.
Career Highlights
Kazuhiro Nakajima is associated with Hitachi, Ltd., a leading company in technology and innovation. His work has contributed to advancements in plasma treatment, which is crucial for various applications in electronics and materials science.
Collaborations
Throughout his career, Nakajima has collaborated with esteemed colleagues such as Shunji Sasabe and Yasumichi Suzuki. These partnerships have fostered innovation and development in the field of plasma technology.
Conclusion
Kazuhiro Nakajima's work in plasma treatment technology exemplifies the impact of innovative thinking in material science. His contributions continue to influence advancements in the industry, showcasing the importance of collaboration and creativity in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
