Kyoto, Japan

Kazuhiro Kondo

This inventor holds 1 USPTO granted patent. Top assignee: Screen Holdings Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiro Kondo. Retrieved from https://idiyas.com/inventor/kazuhiro-kondo-usuq1cuk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kazuhiro Kondo: Innovator in Semiconductor Technology

Introduction

Kazuhiro Kondo is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the reliability of flaw detection in semiconductor wafers.

Latest Patents

Kondo holds a patent for a "Light irradiation type heat treatment method and heat treatment apparatus." This invention involves a reflectance measurement part that measures the reflectance of the back surface of a semiconductor wafer. The imaging parameters of a camera are adjusted based on the measured reflectance, which includes exposure time and sensitivity. The camera then images the back surface of the semiconductor wafer to determine the presence or absence of flaws from the obtained image data. This method allows for reliable detection of flaws, even when the reflectance varies due to thin film deposition.

Career Highlights

Kazuhiro Kondo is currently employed at Screen Holdings Co., Ltd., where he continues to develop innovative solutions in semiconductor technology. His expertise and dedication to his work have positioned him as a valuable asset in his field.

Collaborations

Kondo collaborates with talented colleagues, including Tomohiro Ueno and Ryo Kishimoto, who contribute to the advancement of their projects and innovations.

Conclusion

Kazuhiro Kondo's contributions to semiconductor technology through his patent demonstrate his commitment to innovation and reliability in flaw detection. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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