Kanagawa, Japan

Kazuhiro Hirao

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.3

ph-index = 7

Forward Citations = 74(Granted Patents)


Location History:

  • Kanagawa, JP (1984 - 1992)
  • Hadano, JP (1992)

Company Filing History:


Years Active: 1984-1992

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10 patents (USPTO):Explore Patents

Title: Kazuhiro Hirao: Innovator in Electroplating Technology

Introduction

Kazuhiro Hirao, an accomplished inventor based in Kanagawa, Japan, holds a remarkable portfolio of 10 patents. His innovations primarily focus on advanced methods in electroplating, revolutionizing processes for various materials.

Latest Patents

Among his latest patents, Hirao has developed a "Method of Copper Plating," which employs an electrolytic plating cell featuring a diaphragm. This innovative method effectively separates the anode chamber, containing an insoluble metal electrode, from the cathode chamber where the material is plated. The process ensures a consistent copper ion concentration in the electrolyte, optimizing production efficiency. Additionally, he introduced the "Horizontal Carrying Tape Electroplating Apparatus," designed for continuous, uniform electroplating. This apparatus integrates upper and lower electrodes with insoluble electrodes and diaphragms, allowing for a compact design that enhances productivity while minimizing the use of expensive additives.

Career Highlights

Throughout his career, Kazuhiro Hirao has contributed significantly to the field of electroplating technology. He has worked with notable companies such as Permelec Electrode Ltd. and Almex Inc., where he played pivotal roles in developing advanced plating technologies.

Collaborations

Hirao has collaborated with esteemed colleagues such as Takayuki Shimamune and Hiroshi Asano. Together, they have pushed the boundaries of electroplating techniques, contributing to the industry's advancements.

Conclusion

Kazuhiro Hirao stands out as a prominent figure in the realm of electroplating innovations. His continuous pursuit of excellence and collaboration with expert peers underscores his commitment to advancing technology in this critical field.

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