Kazuhiko Hori

Title: Innovations by Kazuhiko Hori: Pioneering Patents in Exposure Technologies

Introduction

Kazuhiko Hori, an esteemed inventor based in Chiyoda-ku, Japan, has made significant contributions to the field of exposure technologies, holding a remarkable total of four patents. His work primarily revolves around methods and apparatuses that enhance precision in exposure processing, making substantial impacts on industries reliant on photolithography.

Latest Patents

Hori's latest innovations include two notable patents. The first is an "Exposure Method and Exposure Apparatus and Mask," which describes an inventive method for joining a first pattern and a second pattern on a substrate. This is achieved using a mask that contains both a common pattern shared between the two and a non-common pattern that is distinct and forms a continuous structure with the common pattern. The clever selection of patterns allows for a reduction in the number of masks necessary for exposure processing during screen synthesis.

His second innovation, "Surface Height Detecting Apparatus and Exposure Apparatus Using the Same," involves a sophisticated illumination device that emits detection light towards the substrate's surface at an oblique angle. This light is shaped into a slit beam and its width can be altered through an optical shaper. The reflected slit beam, oscillated by a controlled mirror, enables accurate detection of the substrate’s surface height, thereby facilitating precise exposure processes.

Career Highlights

Kazuhiko Hori has established himself at Nikon Corporation, a leading company renowned for its imaging and optical products. His inventive work at this prestigious organization exemplifies the integration of technology and innovation in advancing the capabilities of exposure methodologies.

Collaborations

Throughout his remarkable career, Hori has collaborated with talented individuals such as Akinori Shirato and Toshio Matsuura. Their partnership has led to fruitful exchanges of ideas and has significantly contributed to the development of advanced exposure technologies that are recognized in the industry.

Conclusion

Kazuhiko Hori's contributions to the field of exposure technology through his innovative patents exemplify the spirit of invention and advancement in photolithography. His work continues to pave the way for enhanced techniques and methodologies within the industry, showcasing the profound impact of dedicated inventors on technological progress.