The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2002
Filed:
Aug. 10, 2000
Nikon Corporation, Tokyo, JP;
Abstract
At the time of transferring the pattern image of a mask onto a substrate, an exposure apparatus overlays peripheral portions of exposure areas with respect to a pattern image, which has previously been transferred onto the substrate, with each other, and transfers a predetermined pattern onto the substrate. This exposure apparatus comprises a dose adjusting device capable of adjusting the dose of exposure light at the overlying portion, a shape measuring unit for measuring the shape of the pattern image of the overlying portion formed on the substrate, and a control section for controlling the dose adjusting device based on the result of measurement by the shape measuring unit in such a way that the shape of the pattern image of the overlying portion formed on the substrate becomes an intended shape.