Annaka, Japan

Kazuharo Sato

This inventor holds 1 USPTO granted patent. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuharo Sato. Retrieved from https://idiyas.com/inventor/kazuharo-sato

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Kazuharo Sato: Innovator in Anti-Smudge Technology

Introduction

Kazuharo Sato is a notable inventor based in Annaka, Japan. He has made significant contributions to the field of coatings, particularly with his innovative anti-smudge technology. His work has implications for various industries, enhancing the durability and usability of coated products.

Latest Patents

Kazuharo Sato holds 1 patent for his invention titled "Anti-smudge agent, smudge proof coating composition, smudge proof film, and article coated with smudge proof film." This patent describes an anti-smudge agent that is added to a coating composition to impart smudge-proof properties. The composition includes a silicone resin containing a fluorine atom, which is produced through the hydrolysis or condensation of an organosilicon compound.

Career Highlights

Sato is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to develop innovative solutions in the field of chemical engineering. His expertise in silicone resins and coating technologies has positioned him as a key player in his company.

Collaborations

Kazuharo Sato collaborates with Masaaki Yamaya, contributing to advancements in their field through shared knowledge and expertise.

Conclusion

Kazuharo Sato's work in anti-smudge technology exemplifies the impact of innovative thinking in the coatings industry. His contributions continue to influence product development and enhance user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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