Kazi Sultana

Title: Kazi Sultana: Innovator in Atomic Layer Deposition Technologies

Introduction

Kazi Sultana is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of atomic layer deposition and etch processes. With a total of 2 patents, his work focuses on reducing roughness in various applications.

Latest Patents

Kazi Sultana's latest patents include innovative methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes. These methods involve depositing a conformal layer on a mask by ALD to minimize roughness. Additionally, the process includes etching a layer beneath the mask to create patterned features with reduced roughness. In some implementations, after etching a substrate to a first depth, a conformal layer is deposited on the sidewalls of the features to protect them and further reduce roughness during subsequent etching. The ALD and etch processes are typically performed in a plasma chamber.

Career Highlights

Kazi Sultana is currently employed at Lam Research Corporation, where he continues to advance his research and development efforts. His expertise in atomic layer deposition has positioned him as a key player in the industry.

Collaborations

Throughout his career, Kazi has collaborated with notable colleagues, including Xiang Zhou and Naveed Ansari. These partnerships have contributed to the success of his innovative projects.

Conclusion

Kazi Sultana's work in atomic layer deposition and etch processes showcases his commitment to innovation and excellence in technology. His contributions are paving the way for advancements in reducing roughness in various applications.