Newark, DE, United States of America

Kayla Diemoz

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kayla Diemoz: Innovator in High Conductive Passivation Layers

Introduction

Kayla Diemoz is a prominent inventor based in Newark, Delaware. She has made significant contributions to the field of materials science, particularly in the development of high conductive passivation layers. Her innovative work has led to the granting of a patent that enhances the efficiency of plasma etching processes.

Latest Patents

Kayla holds a patent for "High conductive passivation layers and method of forming the same during high aspect ratio plasma etching." This patent discloses methods for forming a high aspect ratio (HAR) structure during a HAR etch process in a substrate within a reaction chamber. The techniques outlined in her patent are crucial for advancing semiconductor manufacturing processes.

Career Highlights

Kayla is currently employed at American Air Liquide, Inc., where she continues to push the boundaries of innovation in her field. Her work is characterized by a commitment to excellence and a passion for developing cutting-edge technologies that address industry challenges.

Collaborations

Kayla has collaborated with notable colleagues, including Xiangyu Guo and Nathan Stafford. These partnerships have fostered a dynamic environment for innovation and have contributed to the success of her projects.

Conclusion

Kayla Diemoz is a trailblazer in the field of materials science, with her patent and work at American Air Liquide, Inc. showcasing her dedication to innovation. Her contributions are paving the way for advancements in semiconductor technology.

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