Tokyo, Japan

Katuya Sangu

This inventor holds 1 USPTO granted patent. Top assignees: Adtec Engineering Co., Ltd., Canon Components Kabushiki Kaisha. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katuya Sangu. Retrieved from https://idiyas.com/inventor/katuya-sangu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Katuya Sangu: Innovator in Film Mask Technology

Introduction

Katuya Sangu is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of film mask technology, particularly with his innovative patent that enhances the efficiency of placing film masks in contact with objects.

Latest Patents

Katuya Sangu holds a patent for an "Apparatus for placing film mask in contact with object." This invention involves a method where a film mask is abutted to an object on one side, while a fluid is introduced on the other side of the film mask. This process effectively presses the film mask into contact with the object, ensuring precision and reliability in various applications.

Career Highlights

Throughout his career, Katuya Sangu has worked with prominent companies such as Canon Components and Adtec Engineering Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Katuya has collaborated with esteemed colleagues, including Shigeo Nagashima and Haruo Sakamoto. These partnerships have fostered innovation and have been instrumental in the development of his patented technology.

Conclusion

Katuya Sangu's contributions to film mask technology exemplify his dedication to innovation. His patent and collaborations highlight his role as a significant figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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