This inventor holds 1 USPTO granted patent. Top assignees: Hitachi Microcomputer Engineering, Ltd., Hitachi, Ltd.. Active years: 1987.
Company Filing History:
1 out of 149 
1 out of 42,719 
Years Active: 1987
Title: Katuhiro Norisuye: Innovator in Semiconductor Technology
Introduction
Katuhiro Norisuye is a notable inventor based in Kodaira, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and patents. His work has had a lasting impact on the development of integrated circuits.
Latest Patents
Katuhiro Norisuye holds a patent for a semiconductor device that incorporates a bipolar transistor and integrated injection logic (IIL). This device features buried layers in a substrate and active regions. The buried layer in the IIL region has a larger Gummel number than that of the buried layer in the bipolar transistor region, effectively preventing leakage current to the substrate. This design enhances circuit packing density while suppressing unwanted leakage currents. He has 1 patent to his name.
Career Highlights
Throughout his career, Katuhiro Norisuye has worked with prominent companies in the technology sector. He has been associated with Hitachi Microcomputer Engineering, Ltd. and Hitachi, Ltd., where he contributed to various projects and advancements in semiconductor technology.
Collaborations
Katuhiro Norisuye has collaborated with several talented individuals in his field. Notable coworkers include Makoto Hayashi and Tomoyuki Watanabe, who have also made significant contributions to semiconductor research and development.
Conclusion
Katuhiro Norisuye's innovative work in semiconductor technology has paved the way for advancements in integrated circuits. His patent and collaborations reflect his commitment to enhancing the efficiency and performance of electronic devices.