Katuhiko Higashino

Title: Katuhiko Higashino: Innovator in Light-Sensitive Technologies

Introduction

Katuhiko Higashino is a notable inventor based in Hino, Japan. He has made significant contributions to the field of light-sensitive compositions and lithographic printing technologies. With a total of 2 patents to his name, Higashino's work has had a considerable impact on the industry.

Latest Patents

Higashino's latest patents include a light-sensitive composition and a light-sensitive lithographic printing plate. The first patent discloses a light-sensitive composition that contains an o-quinonediazide compound, a novolak resin, and a polymer. The second patent focuses on a light-sensitive lithographic printing plate that comprises a support subjected to graining treatment and anodization treatment. This plate features a layer of a positive light-sensitive composition containing an o-quinonediazide compound, an alkali-soluble resin, and a clathrate compound. The processing method involves image exposure followed by development processing with a developing agent containing an alkali metal silicate.

Career Highlights

Throughout his career, Higashino has worked with prominent companies such as Konica Corporation and Mitsubishi Chemical Corporation. His experience in these organizations has allowed him to refine his expertise in light-sensitive technologies and contribute to innovative solutions in the field.

Collaborations

Higashino has collaborated with notable colleagues, including Shinichi Matsubara and Tomohisa Ohta. These partnerships have further enhanced his work and led to advancements in the technologies he specializes in.

Conclusion

Katuhiko Higashino's contributions to light-sensitive technologies and lithographic printing have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing these fields.