Otsu, Japan

Katsuya Okamoto


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Hisakata, JP (2000)
  • Hirakata, JP (1995 - 2002)
  • Otsu, JP (2005 - 2006)
  • Tsuchiura, JP (2015)

Company Filing History:


Years Active: 1995-2015

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9 patents (USPTO):Explore Patents

Title: Katsuya Okamoto: Innovator in Film Technology

Introduction

Katsuya Okamoto is a prominent inventor based in Otsu, Japan. He has made significant contributions to the field of film technology, holding a total of 9 patents. His work primarily focuses on the development of advanced films used in various applications, including capacitors and magnetic recording media.

Latest Patents

Okamoto's latest patents include innovations such as a biaxially oriented polypropylene film and a polyester film for magnetic recording media. The biaxially oriented polypropylene film features projections on both surfaces, with specific height and density characteristics that enhance its processing into capacitors. This film provides high withstand voltage characteristics and excellent noise performance when utilized in capacitors. Additionally, his polyester film for magnetic recording media incorporates a coating layer with fine particles and organic compounds, designed to improve the film's performance in magnetic recording applications.

Career Highlights

Katsuya Okamoto is currently employed at Toray Industries, Inc., where he continues to push the boundaries of film technology. His innovative work has positioned him as a key figure in the industry, contributing to advancements that benefit various sectors.

Collaborations

Okamoto has collaborated with notable coworkers, including Koichi Abe and Masaaki Ono. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Katsuya Okamoto's contributions to film technology exemplify the impact of innovation in modern applications. His patents reflect a commitment to advancing materials that enhance performance in critical areas such as capacitors and magnetic recording.

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