Nerima-ku, Japan

Katsuya Miyoshi


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 58(Granted Patents)


Location History:

  • Tokyo, JP (1994 - 1995)
  • Niiza, JP (1999)
  • Nerima-ku, JP (2000 - 2001)

Company Filing History:


Years Active: 1994-2001

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5 patents (USPTO):Explore Patents

Title: Katsuya Miyoshi: Innovator in Photolithography Technologies

Introduction

Katsuya Miyoshi is a prominent inventor based in Nerima-ku, Japan, recognized for his contributions to the field of photolithography. He holds five patents, showcasing his innovative approach to optical technologies critical for various applications, particularly in semiconductor manufacturing.

Latest Patents

Among his latest patents are significant advancements in optical members for photolithography and methods for evaluating these optical elements. One notable patent describes a comprehensive evaluation method for assessing the homogeneity of the refractive index of an optical member. This method involves measuring the refractive index distribution, and separating elements into rotationally symmetric and non-rotationally symmetric components, which can subsequently undergo correction treatments. The end result is a photolithography optical member capable of achieving highly precise exposure-transfer patterns, with linewidths of 0.3 micrometers or less.

Career Highlights

Katsuya Miyoshi has made significant strides in his career, particularly through his work at Nikon Corporation. His dedication to enhancing photolithography technologies has positioned him as a key player in advancements that support the growing demands of the semiconductor industry.

Collaborations

Miyoshi's innovative journey has been supported by collaborations with talented coworkers, including Masaharu Kawai and Masami Baba. Together, they have contributed to the development of cutting-edge optical technologies, further solidifying Nikon Corporation's reputation as a leader in the industry.

Conclusion

Katsuya Miyoshi's contributions to photolithography and optical technologies reflect his commitment to innovation and excellence. His patents not only demonstrate his technical expertise but also highlight the importance of precision in modern manufacturing processes. As the semiconductor industry continues to evolve, his work will undoubtedly play a critical role in shaping future developments in this dynamic field.

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