Nagoya, Japan

Katsuya Iwamoto

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Toyota Jidosha Kabushiki Kaisha. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuya Iwamoto. Retrieved from https://idiyas.com/inventor/katsuya-iwamoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Katsuya Iwamoto: Innovator in Film Thickness Measurement

Introduction

Katsuya Iwamoto is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of film thickness measurement, showcasing his expertise through innovative patents. His work has implications in various industries, particularly in manufacturing and materials science.

Latest Patents

Iwamoto holds a patent for a film thickness measuring method and device. This invention involves coordinating the signal waveform of an estimation signal with the reflected light intensity signal. The method ensures that the time point when the film thickness is zero aligns with a base point in the reflected light intensity signal. This allows for accurate measurement of film thickness at desired time points, enhancing precision in various applications.

Career Highlights

Throughout his career, Katsuya Iwamoto has worked with prominent companies, including Toyota Motor Corporation and Kayaba Industry Company, Ltd. His experience in these organizations has contributed to his understanding of practical applications for his inventions.

Collaborations

Iwamoto has collaborated with notable colleagues such as Koji Kondo and Hirokatsu Aramaki. These partnerships have likely enriched his work and led to further advancements in his field.

Conclusion

Katsuya Iwamoto's contributions to film thickness measurement demonstrate his innovative spirit and technical expertise. His patent reflects a significant advancement in measurement technology, showcasing the importance of precision in industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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