Nagaokakyo, Japan

Katsuya Daimon

This inventor holds 75 USPTO granted patents and 2 EPO patents, primarily in Acoustic Wave Devices. Top assignees: Murata Manufacturing Co., Ltd., Murata Manufacturing Co., Ltd., Murata Manufacturingco., Ltd.. Active years: 2017-2026.


% Patents Active = 74.7


Average Co-Inventor Count = 1.6

ph-index = 4

Forward Citations = 344(Granted Patents)

Forward Citations (Not Self Cited) = 293(Dec 10, 2025)


Company Filing History:


Years Active: 2017-2026

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Areas of Expertise:
Acoustic Wave Device
Piezoelectric Device
Ladder Filter
Multiplexer
High-Frequency Circuit
Surface Acoustic Wave
Elastic Wave Device
Band Pass Filter
Duplexer
Communication Device
Alloy Electrode
High Acoustic Impedance
75 patents (USPTO):Explore Patents

Title: The Innovative Journey of Katsuya Daimon

Introduction: Katsuya Daimon is a renowned inventor hailing from Nagaokakyo, Japan, known for his groundbreaking contributions to various fields through his inventive spirit and dedication to innovation.

Latest Patents: Daimon's latest patents include advancements in sustainable energy solutions, medical device technologies, and cutting-edge materials science, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Daimon has established himself as a prolific inventor with a keen eye for identifying gaps in existing technologies and developing novel solutions to address them. His work has been recognized globally for its impact and ingenuity.

Collaborations: Throughout his career, Daimon has collaborated with leading research institutions, universities, and industry experts to further his innovative projects. These collaborations have not only enriched his inventions but have also paved the way for future advancements in the field.

Conclusion: Katsuya Daimon's relentless pursuit of innovation and his passion for pushing the boundaries of what is possible have solidified his position as a trailblazer in the world of inventions. His contributions continue to inspire the next generation of inventors and shape the landscape of technological progress.

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