Tokyo, Japan

Katsutoshi Nonaka


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 175(Granted Patents)


Location History:

  • Yokkaichi, JP (2000)
  • Toyko, JP (2004)
  • Tokyo, JP (2001 - 2007)

Company Filing History:


Years Active: 2000-2007

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovations of Katsutoshi Nonaka

Introduction

Katsutoshi Nonaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of conjugated diene polymers. With a total of four patents to his name, Nonaka's work has had a substantial impact on the industry.

Latest Patents

Nonaka's latest patents include a method for producing conjugated diene polymers with narrow molecular weight distribution. This innovative process involves polymerizing a conjugated diene compound using a catalyst that includes rare earth element compounds and various modifying agents. Another notable patent focuses on a conjugated diene polymer and rubber composition, which boasts high wear resistance and excellent mechanical properties. This polymer is produced through continuous polymerization and features a high content of cis-1,4-bonds, making it suitable for various applications.

Career Highlights

Katsutoshi Nonaka is currently associated with JSR Corporation, where he continues to advance his research in polymer technology. His work has not only contributed to the company's portfolio but has also enhanced the overall understanding of polymer properties and applications.

Collaborations

Throughout his career, Nonaka has collaborated with esteemed colleagues such as Takuo Sone and Iwakazu Hattori. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Katsutoshi Nonaka's contributions to the field of polymer chemistry are noteworthy and continue to influence the industry. His innovative patents and collaborative efforts highlight his commitment to advancing technology in this area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…