Utsunomiya, Japan

Katsuo Matsui

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuo Matsui. Retrieved from https://idiyas.com/inventor/katsuo-matsui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Katsuo Matsui: Innovator in Fan Guard Manufacturing

Introduction

Katsuo Matsui is a notable inventor based in Utsunomiya, Japan. He has made significant contributions to the field of manufacturing, particularly with his innovative methods for creating fan guards. His work has been recognized for its practicality and efficiency in design.

Latest Patents

Matsui holds a patent for a "Method of manufacturing fan guard." This patent describes a unique process involving a plate member where inward slits and outward slits are strategically formed to create louvers. The design allows for enhanced functionality and improved airflow, showcasing Matsui's ingenuity in engineering.

Career Highlights

Matsui is associated with Hitachi, Ltd., a leading company in technology and manufacturing. His role at Hitachi has allowed him to apply his inventive skills in a collaborative environment, contributing to the company's reputation for innovation.

Collaborations

Matsui has worked alongside talented colleagues such as Akio Suzuki and Mitsuo Akiyama. Their combined expertise has fostered a creative atmosphere that encourages the development of groundbreaking technologies.

Conclusion

Katsuo Matsui's contributions to the manufacturing industry, particularly through his patented method for fan guards, highlight his role as an influential inventor. His work continues to impact the field positively, demonstrating the importance of innovation in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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