Location History:
- Yokkaichi, JP (1998 - 1999)
- Tokyo, JP (1998 - 2001)
Company Filing History:
5 out of 377 
3 out of 827 
2 out of 1,058 
Years Active: 1998-2001
Title: Katsuo Koshimura: Innovator in Photosensitive Resin Technology
Introduction
Katsuo Koshimura is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 7 patents. His work has been instrumental in advancing materials used in various applications.
Latest Patents
Among his latest innovations is a water-developable photosensitive resin composition. This composition is designed to enhance the efficiency and effectiveness of photosensitive materials, making them more accessible for various industrial applications.
Career Highlights
Koshimura has worked with prominent companies such as Japan Synthetic Rubber Co., Ltd. and Nippon Paint Company, Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in the realm of synthetic materials.
Collaborations
Throughout his career, Koshimura has collaborated with talented individuals, including Takashi Nishioka and Hozumi Sato. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Katsuo Koshimura's contributions to photosensitive resin technology highlight his role as a key innovator in the field. His patents and collaborations reflect a commitment to advancing material science and its applications.